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Photoresist Composition Including a Chrysene Compound, Method of Forming a Pattern Using the Same, and Method of Fabricating 6-Nitrochrysene

Press/Media

Period6 Jan 2026

Media coverage

1

Media coverage

  • TitlePhotoresist Composition Including a Chrysene Compound, Method of Forming a Pattern Using the Same, and Method of Fabricating 6-Nitrochrysene
    Media name/outletTargeted News Service
    Country/TerritoryUnited States
    Date6/01/26
    PersonsWon Gu Lee