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Research & Business Found Sungkyunkwan University Files WIPO Patent Application for High-selectivity Isotropic Dry Etching Process of Remote Pulsed Plasma

Press/Media

Period20 Jun 2026

Media coverage

1

Media coverage

  • TitleResearch & Business Found Sungkyunkwan University Files WIPO Patent Application for High-selectivity Isotropic Dry Etching Process of Remote Pulsed Plasma
    Media name/outletGlobal IP News. Electrical Patent News
    Country/TerritoryIndia
    Date20/06/26
    PersonsJong-Ho Kim
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