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US Patent Issued to Seoul National University of Technology Center for Industry Collaboration on June 7 for "Method for measuring adhesive strength of thin film using dispersion characteristics of surface waves, and computer-readable recording medium havi

Press/Media

Period7 Jun 2022

Media coverage

1

Media coverage

  • TitleUS Patent Issued to Seoul National University of Technology Center for Industry Collaboration on June 7 for "Method for measuring adhesive strength of thin film using dispersion characteristics of surface waves, and computer-readable recording medium havi
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date7/06/22
    Personssung ook park