3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene

Ju Young Kim; Joonwon Lim; Hyeong Min Jin; Bong Hoon Kim; Seong Jun Jeong; Dong Sung Choi; Dong Jun Li; Sang Ouk Kim

doi:10.1002/adma.201504590

3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene

Ju Young Kim, Joonwon Lim, Hyeong Min Jin, Bong Hoon Kim, Seong Jun Jeong, Dong Sung Choi, Dong Jun Li, Sang Ouk Kim

Research output: Contribution to journal › Article › peer-review

60 Citations (Scopus)

Abstract

Novel 3D self-assembled nanopatterning is presented via tailored crumpling of chemically modified graphene. Block-copolymer self-assembly formed on a layer of chemically modified graphene provides highly dense and uniform 2D nanopatterns, and the controlled crumpling of the chemically modified graphene by mechanical instabilities realizes the controlled 3D transformation of the self-assembled nanopatterns.

Original language	English
Pages (from-to)	1591-1596
Number of pages	6
Journal	Advanced Materials
Volume	28
Issue number	8
DOIs	https://doi.org/10.1002/adma.201504590
Publication status	Published - 24 Feb 2016

Bibliographical note

Publisher Copyright:
© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Keywords

3D
block copolymers
grapheme
instability
self-assembly

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10.1002/adma.201504590

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abstract = "Novel 3D self-assembled nanopatterning is presented via tailored crumpling of chemically modified graphene. Block-copolymer self-assembly formed on a layer of chemically modified graphene provides highly dense and uniform 2D nanopatterns, and the controlled crumpling of the chemically modified graphene by mechanical instabilities realizes the controlled 3D transformation of the self-assembled nanopatterns.",

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AU - Kim, Ju Young

AU - Lim, Joonwon

AU - Jin, Hyeong Min

AU - Kim, Bong Hoon

AU - Jeong, Seong Jun

AU - Choi, Dong Sung

AU - Li, Dong Jun

AU - Kim, Sang Ouk

PY - 2016/2/24

Y1 - 2016/2/24

N2 - Novel 3D self-assembled nanopatterning is presented via tailored crumpling of chemically modified graphene. Block-copolymer self-assembly formed on a layer of chemically modified graphene provides highly dense and uniform 2D nanopatterns, and the controlled crumpling of the chemically modified graphene by mechanical instabilities realizes the controlled 3D transformation of the self-assembled nanopatterns.

AB - Novel 3D self-assembled nanopatterning is presented via tailored crumpling of chemically modified graphene. Block-copolymer self-assembly formed on a layer of chemically modified graphene provides highly dense and uniform 2D nanopatterns, and the controlled crumpling of the chemically modified graphene by mechanical instabilities realizes the controlled 3D transformation of the self-assembled nanopatterns.

KW - 3D

KW - block copolymers

KW - grapheme

KW - instability

KW - self-assembly

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U2 - 10.1002/adma.201504590

DO - 10.1002/adma.201504590

M3 - Article

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JO - Advanced Materials

JF - Advanced Materials

IS - 8

ER -

3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene

Abstract

Bibliographical note

Keywords

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