A Study on the Effect of Base-Reactant in Low-Temperature Atomic Layer Deposition of Zinc Oxide

Engineering

• Atomic Layer Deposition 100%
• Base Solution 50%
• Crystallinity 16%
• Current Ratio 16%
• Deposition Process 50%
• Grown Material 16%
• Low-Temperature 100%
• Ray Diffraction 16%
• Ray Photoelectron Spectroscopy 16%
• Reactant 100%
• Simple Approach 33%
• Thin Films 16%
• Thin-Film Transistor 33%

Material Science

• Film 33%
• Film Growth 33%
• Grain Size 33%
• Photoluminescence 33%
• Thin Films 33%
• Thin-Film Transistor 66%
• X-Ray Diffraction 33%
• X-Ray Photoelectron Spectroscopy 33%
• Zinc 33%
• Zinc Oxide 100%
• ZnO 100%