Achieving High Dielectric Constants in Tetragonal Single-Phase ZrHfO2 Thin Films through the Atomic Layer Deposition Process Using a Mixed Precursor

Jenam Kim, Young Uk Ryu, Ae Jin Lee, Ye Won Kim, Ji Hyeon Hwang, Youngjin Kim, Hansol Oh, Yong Joo Park, Woojin Jeon

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