Abstract
Antiferromagnetic (AFM) NiO thin films are grown epitaxially on vicinal Ag(118) substrate and investigated by x-ray linear dichroism (XLD). We find that the NiO AFM spins exhibit an in-plane spin-reorientation transition from parallel to perpendicular to the step edge direction with increasing the NiO film thickness. In addition to the conventional L2 absorption edge, XLD effect at the Ni L3 absorption edge is also measured and analyzed. The results identify a small energy shift of the L3 peak. Temperature-dependent measurement confirms that the observed XLD effect in this system at the normal incidence of the x rays originates entirely from the NiO magnetic ordering.
Original language | English |
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Article number | 064413 |
Journal | Physical Review B - Condensed Matter and Materials Physics |
Volume | 78 |
Issue number | 6 |
DOIs | |
Publication status | Published - 15 Aug 2008 |