Atomristors: Memory Effect in Atomically-thin Sheets and Record RF Switches

Ruijing Ge, Xiaohan Wu, Myungsoo Kim, Po An Chen, Jianping Shi, Junho Choi, Xiaoqin Li, Yanfeng Zhang, Meng Hsueh Chiang, Jack C. Lee, Deji Akinwande

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

15 Citations (Scopus)

Abstract

Non-volatile resistive switching (NVRS) has been recently observed with synthesized monolayer molybdenum disulfide (MoS2) as the active layer and termed atomristors [1]. In this paper, we demonstrate the fastest switching speed (<15 ns) among all crystalline two-dimensional (2D) related NVRS devices to the best of our knowledge. For the first time, ab-initio simulation results of atomristors elucidate the mechanism revealing favorable substitution of specific metal ions into sulfur vacancies during switching. This insight combined with area-scaling experimental studies indicate a local conductive-bridge-like nature. The proposed mechanism is further supported by sulfur annealing recovery phenomenon. Moreover, exfoliated MoS2 monolayer is demonstrated to have memory effect for the first time, expanding the materials beyond synthesized films. State-of-the-art non-volatile RF switches based on MoS2 atomristors were prepared, featuring 0.25 dB insertion loss, 29 dB isolation (both at 67 GHz), and 70 THz cutoff frequency, a record performance compared to emerging RF switches. Our pioneering work suggests that memory effect maybe present in dozens or 100s of 2D monolayers similar to MoS2 paving the path for new scientific studies for understanding the rich physics, and engineering research towards diverse device applications.

Original languageEnglish
Title of host publication2018 IEEE International Electron Devices Meeting, IEDM 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages22.6.1-22.6.4
ISBN (Electronic)9781728119878
DOIs
Publication statusPublished - 2 Jul 2018
Event64th Annual IEEE International Electron Devices Meeting, IEDM 2018 - San Francisco, United States
Duration: 1 Dec 20185 Dec 2018

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
Volume2018-December
ISSN (Print)0163-1918

Conference

Conference64th Annual IEEE International Electron Devices Meeting, IEDM 2018
Country/TerritoryUnited States
CitySan Francisco
Period1/12/185/12/18

Bibliographical note

Publisher Copyright:
© 2018 IEEE.

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