Abstract
We fabricate the transparent graphene film on glass using spin coating method, and irradiate the electron beam on the film. Novel variation in optoelectronic property was appeared after electron beam irradiation. From microscopic structural analysis, enhanced grain size and flattering of grain were confirmed. The resistance decreases from > 100 Mû to 10 kD, resulting transparent graphene electrode.
| Original language | English |
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| Title of host publication | 21st International Display Workshops 2014, IDW 2014 |
| Publisher | Society for Information Display |
| Pages | 1263-1266 |
| Number of pages | 4 |
| ISBN (Electronic) | 9781510827790 |
| Publication status | Published - 2014 |
| Event | 21st International Display Workshops 2014, IDW 2014 - Niigata, Japan Duration: 3 Dec 2014 → 5 Dec 2014 |
Publication series
| Name | 21st International Display Workshops 2014, IDW 2014 |
|---|---|
| Volume | 2 |
Conference
| Conference | 21st International Display Workshops 2014, IDW 2014 |
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| Country/Territory | Japan |
| City | Niigata |
| Period | 3/12/14 → 5/12/14 |
Bibliographical note
Publisher Copyright:© 2014 . Society for Information Display. All rights reserved.
Keywords
- Crystallization
- Electron beam
- Graphene
- Transparent