Control of amorphous silica nanowire growth by oxygen content of Si-rich oxide

Dong Hee Shin, Sung Kim, Seung Hui Hong, Suk Ho Choi, Kyung Joong Kim

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

Ni-coated Si-rich oxide (SRO, SiOx) on a p-type Si wafer has been annealed with Si powder to grow silica nanowires (NWs), which have a composition of stoichiometric SiO2, irrespective of x. The diameters of the NWs are well controlled from 82 to 23nm by increasing x from 0.4 to 1.2 and they have a uniform distribution at a fixed x. These results suggest that the oxygen content (x) plays a crucial role in determining the diameter of the NWs at the early stage of the NW formation. The growth behaviors of the NWs are explained well based on a modified vapor-liquid-solid mechanism.

Original languageEnglish
Article number045604
JournalNanotechnology
Volume21
Issue number4
DOIs
Publication statusPublished - 2010

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