Correlation between the type of threading dislocations and photoluminescence characteristics at different doping concentrations of Si in GaN films

Chinkyo Kim, Sungwoo Kim, Yoonho Choi, Shi Jong Leem

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

At various doping concentrations of Si in GaN films, the correlation between the type of dislocations and photoluminescence (PL) characteristics was investigated. A different broadening behavior of symmetric and asymmetric Bragg peaks as a function of carrier concentration provided qualitative evidence that the type of threading dislocations generated in GaN layers was strongly dependent on the doping levels of Si. PL spectra in conjunction with x-ray rocking curve measurements suggested that the yellow luminescence associated with deep levels was more strongly related with edge dislocations than screw or mixed ones.

Original languageEnglish
Pages (from-to)6343-6345
Number of pages3
JournalJournal of Applied Physics
Volume92
Issue number10
DOIs
Publication statusPublished - 15 Nov 2002

Fingerprint

Dive into the research topics of 'Correlation between the type of threading dislocations and photoluminescence characteristics at different doping concentrations of Si in GaN films'. Together they form a unique fingerprint.

Cite this