Abstract
Deep-ultraviolet (UV) light is widely used in many industries including medicine because it has sufficient energy to kill viruses and bacteria. However, deep UV with a wavelength of 254 nm can damage human cells, so it is necessary to develop a deep-UV light source with a shorter wavelength to minimize the damage to human cells while still killing viruses. The authors used a carbon nanotube-based cold-cathode electron beam (C-beam) and wide-bandgap anode to fabricate a deep-UV light source with an emission wavelength below 250 nm. The anode was fabricated by annealing ZnO ink on a Si wafer; deep UV with a wavelength of 247 nm and full width at half maximum of 23 nm was obtained. In the case of C-beam irradiation of an anode fabricated on a quartz substrate, deep UV with wavelengths of 208, 226, and 244 nm was generated through excitation with a beam energy of 7 kV and beam currents of 0.3 and 0.5 mA.
Original language | English |
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Article number | 02C103 |
Journal | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics |
Volume | 36 |
Issue number | 2 |
DOIs | |
Publication status | Published - 1 Mar 2018 |
Bibliographical note
Publisher Copyright:© 2017 Author(s).