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Deposition Pressure Dependent Electric Properties of (Hf, Zr)O2 Thin Films Made by RF Sputtering Deposition Method
S. E. Moon, J. H. Kim, J. P. Im, J. Lee, S. Y. Im, S. H. Hong, S. Y. Kang, S. M. Yoon
Research output: Contribution to journal › Article › peer-review