Design and fabrication of spectrally selective emitter for thermophotovoltaic system by using nano-imprint lithography

Engineering

• Conversion Efficiency 50%
• Crystal Structure 100%
• Design Rule 50%
• Electrical Energy 50%
• Etching Process 50%
• Fundamental Limit 50%
• Inductive Coupled Plasma 50%
• Measured Result 50%
• Nanoimprint Lithography 100%
• Power Generation System 50%
• Radiant Energy 50%
• Simulation Result 50%
• Thermal Emitter 100%
• Thermophotovoltaic 100%
• Time Domain 50%

Material Science

• Crystal Structure 40%
• Lithography 100%
• Photonic Crystal 100%
• Reactive Ion Etching 20%
• Thermophotovoltaics 100%
• Tungsten 20%