Development of electron beam lithography using vertically aligned carbon nanotube (VACNT) as a new electron source

Ok Jung Hwang; Ha Rim Lee; Kyu Chang Park

Development of electron beam lithography using vertically aligned carbon nanotube (VACNT) as a new electron source

Ok Jung Hwang, Ha Rim Lee, Kyu Chang Park

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We have developed on electron beam (e-beam) lithography system with novel electron source using vertically aligned Carbon Nanotubes (VACNTs). After the beam was exposed, the PMMA film on ITO glass was developed in MIBK: IPA developer (MIBK: IPA=1:3). As a result, we observed lithography pattern less than 100 mm without electric and magnetic lens. This emitter is differentiated from the previous electron source for e-beam lithography.

Original language	English
Title of host publication	26th International Display Workshops, IDW 2019
Publisher	International Display Workshops
Pages	1431-1433
Number of pages	3
ISBN (Electronic)	9781713806301
Publication status	Published - 2019
Event	26th International Display Workshops, IDW 2019 - Sapporo, Japan Duration: 27 Nov 2019 → 29 Nov 2019

Publication series

Name	Proceedings of the International Display Workshops
Volume	3
ISSN (Print)	1883-2490

Conference

Conference	26th International Display Workshops, IDW 2019
Country/Territory	Japan
City	Sapporo
Period	27/11/19 → 29/11/19

Bibliographical note

Publisher Copyright:
© 2019 ITE and SID

Keywords

Carbon nanotube (CNT)
Electron beam(e-beam) lithography
VACNTs

Cite this

@inproceedings{07d655cea6a944939dec610652750dec,

title = "Development of electron beam lithography using vertically aligned carbon nanotube (VACNT) as a new electron source",

abstract = "We have developed on electron beam (e-beam) lithography system with novel electron source using vertically aligned Carbon Nanotubes (VACNTs). After the beam was exposed, the PMMA film on ITO glass was developed in MIBK: IPA developer (MIBK: IPA=1:3). As a result, we observed lithography pattern less than 100 mm without electric and magnetic lens. This emitter is differentiated from the previous electron source for e-beam lithography.",

keywords = "Carbon nanotube (CNT), Electron beam(e-beam) lithography, VACNTs",

author = "Hwang, {Ok Jung} and Lee, {Ha Rim} and Park, {Kyu Chang}",

note = "Publisher Copyright: {\textcopyright} 2019 ITE and SID; 26th International Display Workshops, IDW 2019 ; Conference date: 27-11-2019 Through 29-11-2019",

year = "2019",

language = "English",

series = "Proceedings of the International Display Workshops",

publisher = "International Display Workshops",

pages = "1431--1433",

booktitle = "26th International Display Workshops, IDW 2019",

}

Hwang, OJ, Lee, HR & Park, KC 2019, Development of electron beam lithography using vertically aligned carbon nanotube (VACNT) as a new electron source. in 26th International Display Workshops, IDW 2019. Proceedings of the International Display Workshops, vol. 3, International Display Workshops, pp. 1431-1433, 26th International Display Workshops, IDW 2019, Sapporo, Japan, 27/11/19.

Development of electron beam lithography using vertically aligned carbon nanotube (VACNT) as a new electron source. / Hwang, Ok Jung; Lee, Ha Rim; Park, Kyu Chang.
26th International Display Workshops, IDW 2019. International Display Workshops, 2019. p. 1431-1433 (Proceedings of the International Display Workshops; Vol. 3).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Development of electron beam lithography using vertically aligned carbon nanotube (VACNT) as a new electron source

AU - Hwang, Ok Jung

AU - Lee, Ha Rim

AU - Park, Kyu Chang

PY - 2019

Y1 - 2019

N2 - We have developed on electron beam (e-beam) lithography system with novel electron source using vertically aligned Carbon Nanotubes (VACNTs). After the beam was exposed, the PMMA film on ITO glass was developed in MIBK: IPA developer (MIBK: IPA=1:3). As a result, we observed lithography pattern less than 100 mm without electric and magnetic lens. This emitter is differentiated from the previous electron source for e-beam lithography.

AB - We have developed on electron beam (e-beam) lithography system with novel electron source using vertically aligned Carbon Nanotubes (VACNTs). After the beam was exposed, the PMMA film on ITO glass was developed in MIBK: IPA developer (MIBK: IPA=1:3). As a result, we observed lithography pattern less than 100 mm without electric and magnetic lens. This emitter is differentiated from the previous electron source for e-beam lithography.

KW - Carbon nanotube (CNT)

KW - Electron beam(e-beam) lithography

KW - VACNTs

UR - http://www.scopus.com/inward/record.url?scp=85105277545&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:85105277545

T3 - Proceedings of the International Display Workshops

SP - 1431

EP - 1433

BT - 26th International Display Workshops, IDW 2019

PB - International Display Workshops

T2 - 26th International Display Workshops, IDW 2019

Y2 - 27 November 2019 through 29 November 2019

ER -

Development of electron beam lithography using vertically aligned carbon nanotube (VACNT) as a new electron source

Abstract

Publication series

Conference

Bibliographical note

Keywords

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