Abstract
(Figure Presented) Dip-pen nanolithography of ferroelectric PTO nanodots is described. This position-controlled dip-pen nanolithography using a silicon nitride cantilever produced an array of ferroelectric nanodots with a minimum lateral dimension of ∼37 nm on a Nb-doped SrTiO3 substrate. This minimum-sized PTO dot is characterized by single-domain epitaxial growth with an enhanced tetragonality (c/a ratio) of 1.08.
| Original language | English |
|---|---|
| Pages (from-to) | 14676-14678 |
| Number of pages | 3 |
| Journal | Journal of the American Chemical Society |
| Volume | 131 |
| Issue number | 41 |
| DOIs | |
| Publication status | Published - 21 Oct 2009 |
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