Dissociative photoionization of bis(Dimethyl-µ-isopropylamido-aluminum) and bis(dimethyl-µ-t-butylamido-aluminum) in the region hv=65-133 ev by mass spectrometry

Seung Min Park; Bong Hyun Boo; Yoonsoo Kim; Joon T. Park; Inosuke Koyano

doi:10.1143/JJAP.34.L933

Dissociative photoionization of bis(Dimethyl-µ-isopropylamido-aluminum) and bis(dimethyl-µ-t-butylamido-aluminum) in the region hv=65-133 ev by mass spectrometry

Seung Min Park
, Bong Hyun Boo
, Yoonsoo Kim
, Joon T. Park
, Inosuke Koyano

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

The dissociative photoionization studies of bis(dimethyl-µ-isopropylamido-aluminum) and bis(dimethyl-µ-t-butylamido-aluminum) in the photon energy range of 67-133 eV have been performed as preliminary studies of synchrotron radiation single-precursor chemical vapor deposition. Photoelectron-photoion coincidence and photoion-photoion coincidence mass spectra are analyzed to understand the effects of A1:2 p and A1:2 s core excitation on the branching ratios of photofragments produced by absorption of synchrotron radiation.

Original language	English
Pages (from-to)	L933-L936
Journal	Japanese Journal of Applied Physics
Volume	34
Issue number	7
DOIs	https://doi.org/10.1143/JJAP.34.L933
Publication status	Published - Jul 1995

Keywords

Aluminum nitride thin film
Dissociative photoionizaiion
Organometallic chemical vapor deposition
Single precursor
Synchrotron radiation

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10.1143/JJAP.34.L933

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@article{fa2c814111334939aa59065c05f97c88,

title = "Dissociative photoionization of bis(Dimethyl-µ-isopropylamido-aluminum) and bis(dimethyl-µ-t-butylamido-aluminum) in the region hv=65-133 ev by mass spectrometry",

abstract = "The dissociative photoionization studies of bis(dimethyl-µ-isopropylamido-aluminum) and bis(dimethyl-µ-t-butylamido-aluminum) in the photon energy range of 67-133 eV have been performed as preliminary studies of synchrotron radiation single-precursor chemical vapor deposition. Photoelectron-photoion coincidence and photoion-photoion coincidence mass spectra are analyzed to understand the effects of A1:2 p and A1:2 s core excitation on the branching ratios of photofragments produced by absorption of synchrotron radiation.",

keywords = "Aluminum nitride thin film, Dissociative photoionizaiion, Organometallic chemical vapor deposition, Single precursor, Synchrotron radiation",

author = "Park, \{Seung Min\} and Boo, \{Bong Hyun\} and Yoonsoo Kim and Park, \{Joon T.\} and Inosuke Koyano",

year = "1995",

month = jul,

doi = "10.1143/JJAP.34.L933",

language = "English",

volume = "34",

pages = "L933--L936",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "7",

}

TY - JOUR

T1 - Dissociative photoionization of bis(Dimethyl-µ-isopropylamido-aluminum) and bis(dimethyl-µ-t-butylamido-aluminum) in the region hv=65-133 ev by mass spectrometry

AU - Park, Seung Min

AU - Boo, Bong Hyun

AU - Kim, Yoonsoo

AU - Park, Joon T.

AU - Koyano, Inosuke

PY - 1995/7

Y1 - 1995/7

N2 - The dissociative photoionization studies of bis(dimethyl-µ-isopropylamido-aluminum) and bis(dimethyl-µ-t-butylamido-aluminum) in the photon energy range of 67-133 eV have been performed as preliminary studies of synchrotron radiation single-precursor chemical vapor deposition. Photoelectron-photoion coincidence and photoion-photoion coincidence mass spectra are analyzed to understand the effects of A1:2 p and A1:2 s core excitation on the branching ratios of photofragments produced by absorption of synchrotron radiation.

AB - The dissociative photoionization studies of bis(dimethyl-µ-isopropylamido-aluminum) and bis(dimethyl-µ-t-butylamido-aluminum) in the photon energy range of 67-133 eV have been performed as preliminary studies of synchrotron radiation single-precursor chemical vapor deposition. Photoelectron-photoion coincidence and photoion-photoion coincidence mass spectra are analyzed to understand the effects of A1:2 p and A1:2 s core excitation on the branching ratios of photofragments produced by absorption of synchrotron radiation.

KW - Aluminum nitride thin film

KW - Dissociative photoionizaiion

KW - Organometallic chemical vapor deposition

KW - Single precursor

KW - Synchrotron radiation

UR - https://www.scopus.com/pages/publications/0029345084

U2 - 10.1143/JJAP.34.L933

DO - 10.1143/JJAP.34.L933

M3 - Article

AN - SCOPUS:0029345084

SN - 0021-4922

VL - 34

SP - L933-L936

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 7

ER -

Dissociative photoionization of bis(Dimethyl-µ-isopropylamido-aluminum) and bis(dimethyl-µ-t-butylamido-aluminum) in the region hv=65-133 ev by mass spectrometry

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