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Disturb-free ferroelectric nonvolatile memory cell for oxide TFT-based low-power display panels

  • Byeong Hoon Kim
  • , Chun Won Byun
  • , Shin Hyuk Yang
  • , Soon Won Jung
  • , Min Ki Ryu
  • , Sang Hee Ko Park
  • , Chi Sun Hwang
  • , Kyoung Ik Cho
  • , Oh Sang Kwon
  • , Eun Suk Park
  • , Kyoung Hwan Kim
  • , Kee Chan Park
  • , Sung Min Yoon

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A nonvolatile ferroelectric random access memory cell was proposed for the power reduction of display panel, which was designed to be composed of two In-Ga-Zn-O (IGZO) thin-film-transistors (TFTs) and a ferroelectric memory TFT (feTFT) (2T/1FT). Amorphous IGZO and poly (vinylidene fluoride- trifluoroethylene) [P(VDF-TrFE)] were employed as semiconducting channels for both TFTs and a gate insulator for feFET, respectively. All the fabrication processes were performed below 200 °C on the glass substrate [1-2]. The fabricated 2T/1FT memory cell successfully demonstrated the write/readout and disturb-free operations.

Original languageEnglish
Title of host publication10th International Meeting on Information Display and International Display Manufacturing Conference and Asia Display 2010, IMID/IDMC/ASIA Display 2010
Pages70-71
Number of pages2
Publication statusPublished - 2010
Event10th International Meeting on Information Display and International Display Manufacturing Conference and Asia Display 2010, IMID/IDMC/ASIA Display 2010 - Seoul, Korea, Republic of
Duration: 11 Oct 201015 Oct 2010

Publication series

NameProceedings of International Meeting on Information Display
ISSN (Print)1738-7558

Conference

Conference10th International Meeting on Information Display and International Display Manufacturing Conference and Asia Display 2010, IMID/IDMC/ASIA Display 2010
Country/TerritoryKorea, Republic of
CitySeoul
Period11/10/1015/10/10

Keywords

  • Ferroelectric memory TFT
  • Nonvolatile memory cell
  • Oxide TFT

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