Effect of oxygen partial pressure on the performance of a-IGZO TFTs with a self-aligned top-gate coplanar structure

Sang Hyun Ryu, Dong Han Kang, Youngchul Park, In Kang, Jin Jang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Effect of oxygen partial-pressure (Po) is investigated in amorphous-InGaZnO thin-film transistors. In addition to improved stability, the threshold-voltage shifts from -0.3 to 0.8 V, while mobility decreases from 20 to 8 cm2/V·s as the Po increases from 2 to 16 seem. Po can therefore be used to control the threshold-voltage.

Original languageEnglish
Title of host publicationSociety for Information Display - 18th International Display Workshops 2011, IDW'11
Pages599-602
Number of pages4
Publication statusPublished - 2011
Event18th International Display Workshops 2011, IDW 2011 - Nagoya, Japan
Duration: 7 Dec 20119 Dec 2011

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Conference

Conference18th International Display Workshops 2011, IDW 2011
Country/TerritoryJapan
CityNagoya
Period7/12/119/12/11

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