TY - GEN
T1 - Effect of oxygen partial pressure on the performance of a-IGZO TFTs with a self-aligned top-gate coplanar structure
AU - Ryu, Sang Hyun
AU - Kang, Dong Han
AU - Park, Youngchul
AU - Kang, In
AU - Jang, Jin
N1 - Copyright:
Copyright 2012 Elsevier B.V., All rights reserved.
PY - 2011
Y1 - 2011
N2 - Effect of oxygen partial-pressure (Po) is investigated in amorphous-InGaZnO thin-film transistors. In addition to improved stability, the threshold-voltage shifts from -0.3 to 0.8 V, while mobility decreases from 20 to 8 cm2/V·s as the Po increases from 2 to 16 seem. Po can therefore be used to control the threshold-voltage.
AB - Effect of oxygen partial-pressure (Po) is investigated in amorphous-InGaZnO thin-film transistors. In addition to improved stability, the threshold-voltage shifts from -0.3 to 0.8 V, while mobility decreases from 20 to 8 cm2/V·s as the Po increases from 2 to 16 seem. Po can therefore be used to control the threshold-voltage.
UR - http://www.scopus.com/inward/record.url?scp=84870685199&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:84870685199
SN - 9781622761906
T3 - Proceedings of the International Display Workshops
SP - 599
EP - 602
BT - Society for Information Display - 18th International Display Workshops 2011, IDW'11
T2 - 18th International Display Workshops 2011, IDW 2011
Y2 - 7 December 2011 through 9 December 2011
ER -