Abstract
Carbon nanotube arrays were selectively patterned using micro molding in capillary (MIMIC) process. Also we can control the thickness of the seed forming resist using MIMIC process. The structures of CNTs can be easily controlled depending on the thickness of resist film. The turn-on field for 10 μA/cm2 was 2.2 V/μm.
Original language | English |
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Pages | 1371-1374 |
Number of pages | 4 |
Publication status | Published - 2008 |
Event | 15th International Display Workshops, IDW '08 - Niigata, Japan Duration: 3 Dec 2008 → 5 Dec 2008 |
Conference
Conference | 15th International Display Workshops, IDW '08 |
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Country/Territory | Japan |
City | Niigata |
Period | 3/12/08 → 5/12/08 |