Erratum: Copper gate hydrogenated amorphous silicon TFT with thin buffer layers (IEEE Electron Device Letters (June 2002) 23 (324-326))

Sang Wook Lee, Kyu Sik Cho, Byung Kwon Choo, Jin Jang

Research output: Contribution to journal › Comment/debate

Original language	English
Pages (from-to)	565
Number of pages	1
Journal	IEEE Electron Device Letters
Volume	23
Issue number	9
DOIs	https://doi.org/10.1109/LED.2002.803742
Publication status	Published - Sept 2002

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