Erratum: Low temperature solid phase crystallization of amorphous silicon at 380 °c (Journal of Applied Physics (1998) 84 (6463))

Soo Young Yoon, Jae Young Oh, Chae Ok Kim, Jin Jang

Research output: Contribution to journal › Comment/debate

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Copyright 2007 Elsevier B.V., All rights reserved.

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title = "Erratum: Low temperature solid phase crystallization of amorphous silicon at 380 °c (Journal of Applied Physics (1998) 84 (6463))",

author = "Yoon, {Soo Young} and Oh, {Jae Young} and Kim, {Chae Ok} and Jin Jang",

year = "2007",

doi = "10.1063/1.2737967",

language = "English",

volume = "101",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "10",

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T2 - Low temperature solid phase crystallization of amorphous silicon at 380 °c (Journal of Applied Physics (1998) 84 (6463))

AU - Yoon, Soo Young

AU - Oh, Jae Young

AU - Kim, Chae Ok

AU - Jang, Jin

PY - 2007

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U2 - 10.1063/1.2737967

DO - 10.1063/1.2737967

M3 - Comment/debate

AN - SCOPUS:34249897768

SN - 0021-8979

VL - 101

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 10

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ER -