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Fabrication of antireflection nanostructures on GaAs by holographic lithography for device applications

  • Y. M. Song
  • , S. Y. Bae
  • , J. S. Yu
  • , Y. T. Lee

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We demonstrate the fabrication of antireflection nanostructures on GaAs using holographic lithography. Measured results of the fabricated nanostructures are in good agreement with the calculated values using a RCWA model, effectively suppressing the surface reflection over visible and near-infrared ranges.

Original languageEnglish
Title of host publicationConference on Lasers and Electro-Optics, CLEO 2009
Publication statusPublished - 2009
EventConference on Lasers and Electro-Optics, CLEO 2009 - Baltimore, MD, United States
Duration: 31 May 20095 Jun 2009

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceConference on Lasers and Electro-Optics, CLEO 2009
Country/TerritoryUnited States
CityBaltimore, MD
Period31/05/095/06/09

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