Fabrication of high current CNTs emitter with resist-assisted patterning process

An Na Ha; Su Woong Lee; Woo Mi Bae; Hee Chul Woo; Young Ju Eom; Jin Jang; Kyu Chang Park

Fabrication of high current CNTs emitter with resist-assisted patterning process

An Na Ha, Su Woong Lee, Woo Mi Bae, Hee Chul Woo, Young Ju Eom, Jin Jang, Kyu Chang Park

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

The high electron emission property of carbon nanotube (CNT) emitter grown is studied. CNT emitters were grown on silicon wafer by the resist-assisted patterning (RAP) process. The current of grown CNT emitter was high level more than 50mA. Through structural and electrical analysis, we discuss about the emission property of grown emitters.

Original language	English
Title of host publication	Society for Information Display - 18th International Display Workshops 2011, IDW'11
Pages	1175-1177
Number of pages	3
Publication status	Published - 2011
Event	18th International Display Workshops 2011, IDW 2011 - Nagoya, Japan Duration: 7 Dec 2011 → 9 Dec 2011

Publication series

Name	Proceedings of the International Display Workshops
Volume	2
ISSN (Print)	1883-2490

Conference

Conference	18th International Display Workshops 2011, IDW 2011
Country/Territory	Japan
City	Nagoya
Period	7/12/11 → 9/12/11

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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@inproceedings{96e29f38644c4a57b964288129fec66e,

title = "Fabrication of high current CNTs emitter with resist-assisted patterning process",

abstract = "The high electron emission property of carbon nanotube (CNT) emitter grown is studied. CNT emitters were grown on silicon wafer by the resist-assisted patterning (RAP) process. The current of grown CNT emitter was high level more than 50mA. Through structural and electrical analysis, we discuss about the emission property of grown emitters.",

author = "Ha, {An Na} and Lee, {Su Woong} and Bae, {Woo Mi} and Woo, {Hee Chul} and Eom, {Young Ju} and Jin Jang and Park, {Kyu Chang}",

year = "2011",

language = "English",

isbn = "9781622761906",

series = "Proceedings of the International Display Workshops",

pages = "1175--1177",

booktitle = "Society for Information Display - 18th International Display Workshops 2011, IDW'11",

}

Ha, AN, Lee, SW, Bae, WM, Woo, HC, Eom, YJ, Jang, J & Park, KC 2011, Fabrication of high current CNTs emitter with resist-assisted patterning process. in Society for Information Display - 18th International Display Workshops 2011, IDW'11. Proceedings of the International Display Workshops, vol. 2, pp. 1175-1177, 18th International Display Workshops 2011, IDW 2011, Nagoya, Japan, 7/12/11.

Fabrication of high current CNTs emitter with resist-assisted patterning process. / Ha, An Na; Lee, Su Woong; Bae, Woo Mi et al.
Society for Information Display - 18th International Display Workshops 2011, IDW'11. 2011. p. 1175-1177 (Proceedings of the International Display Workshops; Vol. 2).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Fabrication of high current CNTs emitter with resist-assisted patterning process

AU - Ha, An Na

AU - Lee, Su Woong

AU - Bae, Woo Mi

AU - Woo, Hee Chul

AU - Eom, Young Ju

AU - Jang, Jin

AU - Park, Kyu Chang

PY - 2011

Y1 - 2011

N2 - The high electron emission property of carbon nanotube (CNT) emitter grown is studied. CNT emitters were grown on silicon wafer by the resist-assisted patterning (RAP) process. The current of grown CNT emitter was high level more than 50mA. Through structural and electrical analysis, we discuss about the emission property of grown emitters.

AB - The high electron emission property of carbon nanotube (CNT) emitter grown is studied. CNT emitters were grown on silicon wafer by the resist-assisted patterning (RAP) process. The current of grown CNT emitter was high level more than 50mA. Through structural and electrical analysis, we discuss about the emission property of grown emitters.

UR - http://www.scopus.com/inward/record.url?scp=84870695708&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84870695708

SN - 9781622761906

T3 - Proceedings of the International Display Workshops

SP - 1175

EP - 1177

BT - Society for Information Display - 18th International Display Workshops 2011, IDW'11

T2 - 18th International Display Workshops 2011, IDW 2011

Y2 - 7 December 2011 through 9 December 2011

ER -

Fabrication of high current CNTs emitter with resist-assisted patterning process

Abstract

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Conference

UN SDGs

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