Field emission of nitrogen doped diamondlike carbon films deposited by plasma enhanced chemical vapor deposition

Kyu Chang Park; Jong Hyun Moon; Suk Jae Chung; Jin Jang

doi:10.1116/1.589597

Field emission of nitrogen doped diamondlike carbon films deposited by plasma enhanced chemical vapor deposition

Kyu Chang Park
, Jong Hyun Moon
, Suk Jae Chung
, Jin Jang

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

The N doping effect on the electrical conductivity and electron emission property for diamondlike carbon (DLC) films deposited by plasma enhanced chemical vapor deposition (PECVD) has been studied. The electrical conductivity can be widely varied by n-type doping of the DLC. The relationship between the prefactor of conductivity and the conductivity activation energy satisfy the Meyer-Neldel relation: σ₀ = σ₀₀ exp(AE_a) with A = 19 eV^-1 and σ₀₀ = 9 × 10^-8 S/cm. The emission current for heavily N doped DLC films is much higher than that of undoped DLC even though the lightly N doped film shows much smaller current.

Original language	English
Pages (from-to)	454-456
Number of pages	3
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	15
Issue number	2
DOIs	https://doi.org/10.1116/1.589597
Publication status	Published - 1997

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10.1116/1.589597

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title = "Field emission of nitrogen doped diamondlike carbon films deposited by plasma enhanced chemical vapor deposition",

abstract = "The N doping effect on the electrical conductivity and electron emission property for diamondlike carbon (DLC) films deposited by plasma enhanced chemical vapor deposition (PECVD) has been studied. The electrical conductivity can be widely varied by n-type doping of the DLC. The relationship between the prefactor of conductivity and the conductivity activation energy satisfy the Meyer-Neldel relation: σ0 = σ00 exp(AEa) with A = 19 eV-1 and σ00 = 9 × 10-8 S/cm. The emission current for heavily N doped DLC films is much higher than that of undoped DLC even though the lightly N doped film shows much smaller current.",

author = "Park, \{Kyu Chang\} and Moon, \{Jong Hyun\} and Chung, \{Suk Jae\} and Jin Jang",

year = "1997",

doi = "10.1116/1.589597",

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pages = "454--456",

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T1 - Field emission of nitrogen doped diamondlike carbon films deposited by plasma enhanced chemical vapor deposition

AU - Park, Kyu Chang

AU - Moon, Jong Hyun

AU - Chung, Suk Jae

AU - Jang, Jin

PY - 1997

Y1 - 1997

N2 - The N doping effect on the electrical conductivity and electron emission property for diamondlike carbon (DLC) films deposited by plasma enhanced chemical vapor deposition (PECVD) has been studied. The electrical conductivity can be widely varied by n-type doping of the DLC. The relationship between the prefactor of conductivity and the conductivity activation energy satisfy the Meyer-Neldel relation: σ0 = σ00 exp(AEa) with A = 19 eV-1 and σ00 = 9 × 10-8 S/cm. The emission current for heavily N doped DLC films is much higher than that of undoped DLC even though the lightly N doped film shows much smaller current.

AB - The N doping effect on the electrical conductivity and electron emission property for diamondlike carbon (DLC) films deposited by plasma enhanced chemical vapor deposition (PECVD) has been studied. The electrical conductivity can be widely varied by n-type doping of the DLC. The relationship between the prefactor of conductivity and the conductivity activation energy satisfy the Meyer-Neldel relation: σ0 = σ00 exp(AEa) with A = 19 eV-1 and σ00 = 9 × 10-8 S/cm. The emission current for heavily N doped DLC films is much higher than that of undoped DLC even though the lightly N doped film shows much smaller current.

UR - https://www.scopus.com/pages/publications/0010006158

U2 - 10.1116/1.589597

DO - 10.1116/1.589597

M3 - Article

AN - SCOPUS:0010006158

SN - 1071-1023

VL - 15

SP - 454

EP - 456

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 2

ER -

Field emission of nitrogen doped diamondlike carbon films deposited by plasma enhanced chemical vapor deposition

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