Graphene/Si-nanowire heterostructure molecular sensors

Jungkil Kim, Si Duk Oh, Ju Hwan Kim, Dong Hee Shin, Sung Kim, Suk Ho Choi

Research output: Contribution to journalArticlepeer-review

50 Citations (Scopus)

Abstract

Wafer-scale graphene/Si-nanowire (Si-NW) array heterostructures for molecular sensing have been fabricated by vertically contacting single-layer graphene with high-density Si NWs. Graphene is grown in large scale by chemical vapour deposition and Si NWs are vertically aligned by metal-assisted chemical etching of Si wafer. Graphene plays a key role in preventing tips of vertical Si NWs from being bundled, thereby making Si NWs stand on Si wafer separately from each other under graphene, a critical structural feature for the uniform Schottky-type junction between Si NWs and graphene. The molecular sensors respond very sensitively to gas molecules by showing 37 and 1280% resistance changes within 3.5/0.15 and 12/0.15 response/recovery times under O 2 and H 2 exposures in air, respectively, highest performances ever reported. These results together with the sensor responses in vacuum are discussed based on the surface-transfer doping mechanism.

Original languageEnglish
Article number5384
JournalScientific Reports
Volume4
DOIs
Publication statusPublished - 20 Jun 2014

Bibliographical note

Funding Information:
This work was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT & Future Planning (No. 2011-0017373).

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