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High mobility LTPS TFTs with 150 nm poly-Si by blue laser annealing on glass

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We report the blue laser annealing (BLA) of a-Si and its application to TFT on glass. The grain size is larger than 3 urn which is much higher that of ELA poly-Si. A 150 nm BLA poly-Si TFT exhibits the field-effect of 126.57 cmVVs, subthreshold swing of 255 mV/decade and threshold voltage of-0.1 V. The TFT performance is very stable under the positive and negative bias stresses.

Original languageEnglish
Title of host publication24th International Display Workshops, IDW 2017
PublisherInternational Display Workshops
Pages453-455
Number of pages3
ISBN (Electronic)9781510858992
Publication statusPublished - 2017
Event24th International Display Workshops, IDW 2017 - Sendai, Japan
Duration: 6 Dec 20178 Dec 2017

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Conference

Conference24th International Display Workshops, IDW 2017
Country/TerritoryJapan
CitySendai
Period6/12/178/12/17

Bibliographical note

Publisher Copyright:
© 2017 Proceedings of the International Display Workshops. All rights reserved.

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 3 - Good Health and Well-being
    SDG 3 Good Health and Well-being

Keywords

  • Blue laser annealing
  • Crystallization
  • High mobility
  • Low temperature poly crystalline silicon (LTPS)
  • TFT

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