Abstract
Self-aligned coplanar thin-film transistors (TFTs) with a novel dual channel architecture comprising of low mobility and high mobility oxide semiconductors show high field-effect mobility of > 50 cm2/Vs with positive threshold voltage of > 0 V and low offleakage current of < 1 pA. The TFTs with dual channel allow higher mobility than TFTs with a single high mobility channel because the TFTs with dual channel allow strong electron accumulation due to high electron densities both at the interface between gate insulator and 1st oxide semiconductor and at the hetero-junction interface between 1st and 2nd oxide semiconductors.
Original language | English |
---|---|
Pages (from-to) | 65-68 |
Number of pages | 4 |
Journal | Digest of Technical Papers - SID International Symposium |
Volume | 52 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2021 |
Event | 58th International Symposium on Digest of Technical Papers, ICDT 2021 - Virtual, Online Duration: 17 May 2021 → 21 May 2021 |
Bibliographical note
Publisher Copyright:© 2021 SID.
Keywords
- Dual Channel
- High Mobility
- IGZO
- IZO
- Short Channel Length (SCL)
- Thin Film Transistor (TFT)
- Top Gate (TG)