High mobility self-aligned coplanar thin-film transistors with a novel dual channel oxide semiconductor architecture

Jung Bae Kim, Dong Kil Yim, Soo Young Choi, Daniel Severin, Jian Liu, Markus Hanika, Marcus Bender, Mohammad Masum Billah, Abu Bakar Siddik, Jin Jang

Research output: Contribution to journalConference articlepeer-review

4 Citations (Scopus)

Abstract

Self-aligned coplanar thin-film transistors (TFTs) with a novel dual channel architecture comprising of low mobility and high mobility oxide semiconductors show high field-effect mobility of > 50 cm2/Vs with positive threshold voltage of > 0 V and low offleakage current of < 1 pA. The TFTs with dual channel allow higher mobility than TFTs with a single high mobility channel because the TFTs with dual channel allow strong electron accumulation due to high electron densities both at the interface between gate insulator and 1st oxide semiconductor and at the hetero-junction interface between 1st and 2nd oxide semiconductors.

Original languageEnglish
Pages (from-to)65-68
Number of pages4
JournalDigest of Technical Papers - SID International Symposium
Volume52
Issue number1
DOIs
Publication statusPublished - 2021
Event58th International Symposium on Digest of Technical Papers, ICDT 2021 - Virtual, Online
Duration: 17 May 202121 May 2021

Bibliographical note

Publisher Copyright:
© 2021 SID.

Keywords

  • Dual Channel
  • High Mobility
  • IGZO
  • IZO
  • Short Channel Length (SCL)
  • Thin Film Transistor (TFT)
  • Top Gate (TG)

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