High performance AOS-based offset TFTs for kickback voltage reduction

Mallory Mativenga, Dong Han Kang, Young Sik Ahn, Jin Jang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper shows that amorphous-oxide-semiconductor (AOS)-based thin-film transistors (TFTs) with drain- and/or source-offsets perform much better compared to Si-based offset TFTs in literature. Attributes of AOS-based offset TFTs include improved stability, high on-currents, independence of threshold-voltage from offset-length, and possibility for kickback-voltage reduction in active-matrix display applications.

Original languageEnglish
Title of host publicationSociety for Information Display - 19th International Display Workshops 2012, IDW/AD 2012
Pages261-263
Number of pages3
Publication statusPublished - 2012
Event19th International Display Workshops in Conjunction with Asia Display 2012, IDW/AD 2012 - Kyoto, Japan
Duration: 4 Dec 20127 Dec 2012

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Conference

Conference19th International Display Workshops in Conjunction with Asia Display 2012, IDW/AD 2012
Country/TerritoryJapan
CityKyoto
Period4/12/127/12/12

Keywords

  • Amorphous-indium-gallium-zinc-oxide (a-IGZO)
  • Display
  • Kickback voltage
  • Offset
  • Thin-film transistor (TFT)

Fingerprint

Dive into the research topics of 'High performance AOS-based offset TFTs for kickback voltage reduction'. Together they form a unique fingerprint.

Cite this