High performance carbon nanotube emitters beam (C-beam) for display device application

Jung Su Kang, Su Woong Lee, Ha Rim Lee, Ji Han Hong, Shikili Callixte, Hee Tae Park, Won Jong Kim, Kyu Chang Park

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)

Abstract

We introduced a carbon nanotube electron beam (C-beam) exposure technique for thin films for display devices. As an electron source, the CNT emitters were placed on cathode electrode. Electrons through gate mesh, with higher accelerated energy, impact thin film on the anode plate. For display device application, amorphous silicon (a-Si:H) thin films were deposited on glass substrate and then C-beams exposed. After moderated C-beam exposure, the silicon film changes to phase of crystalline one. The structural modification was confirmed with Raman spectrum and the enhanced electrical performances were measured with I-V systems. The silicon crystalline properties were strongly depending on the C-Beam exposure conditions.

Original languageEnglish
Title of host publicationTechnical Digest - 2014 27th International Vacuum Nanoelectronics Conference, IVNC 2014
EditorsHans-Heinrich Braun, Oliver Groening, Martin Paraliev, Thomas Feurer, Soichiro Tsujino, Jens Gobrecht
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages134-135
Number of pages2
ISBN (Electronic)9781479953080
DOIs
Publication statusPublished - 2014
Event2014 27th International Vacuum Nanoelectronics Conference, IVNC 2014 - Engelberg, Switzerland
Duration: 6 Jul 201410 Jul 2014

Publication series

NameTechnical Digest - 2014 27th International Vacuum Nanoelectronics Conference, IVNC 2014

Conference

Conference2014 27th International Vacuum Nanoelectronics Conference, IVNC 2014
Country/TerritorySwitzerland
CityEngelberg
Period6/07/1410/07/14

Bibliographical note

Publisher Copyright:
© 2014 IEEE.

Keywords

  • CNT
  • Field emission
  • RAP
  • Triode
  • crystallization

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