Abstract
We introduced a carbon nanotube electron beam (C-beam) exposure technique for thin films for display devices. As an electron source, the CNT emitters were placed on cathode electrode. Electrons through gate mesh, with higher accelerated energy, impact thin film on the anode plate. For display device application, amorphous silicon (a-Si:H) thin films were deposited on glass substrate and then C-beams exposed. After moderated C-beam exposure, the silicon film changes to phase of crystalline one. The structural modification was confirmed with Raman spectrum and the enhanced electrical performances were measured with I-V systems. The silicon crystalline properties were strongly depending on the C-Beam exposure conditions.
Original language | English |
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Title of host publication | Technical Digest - 2014 27th International Vacuum Nanoelectronics Conference, IVNC 2014 |
Editors | Hans-Heinrich Braun, Oliver Groening, Martin Paraliev, Thomas Feurer, Soichiro Tsujino, Jens Gobrecht |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 134-135 |
Number of pages | 2 |
ISBN (Electronic) | 9781479953080 |
DOIs | |
Publication status | Published - 2014 |
Event | 2014 27th International Vacuum Nanoelectronics Conference, IVNC 2014 - Engelberg, Switzerland Duration: 6 Jul 2014 → 10 Jul 2014 |
Publication series
Name | Technical Digest - 2014 27th International Vacuum Nanoelectronics Conference, IVNC 2014 |
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Conference
Conference | 2014 27th International Vacuum Nanoelectronics Conference, IVNC 2014 |
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Country/Territory | Switzerland |
City | Engelberg |
Period | 6/07/14 → 10/07/14 |
Bibliographical note
Publisher Copyright:© 2014 IEEE.
Keywords
- CNT
- Field emission
- RAP
- Triode
- crystallization