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Highly reliable shift register with coplanar a-IGZO TFTs by splitting top gate into dual gates

  • Duk Young Jeong
  • , Ji Seob Lee
  • , Yuanfeng Chen
  • , Suhui Lee
  • , Jin Jang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)

Abstract

We report the effect of gate splitting on the performance and stability of coplanar amorphous-Indium-Gallium-Zinc-Oxide (a- IGZO) TFTs. Splitting gate reduces the threshold voltage (Vth) shift by PBTS (positive bias temperature stress) and improves the performance uniformity. The gate driver made of split gates also shows better performance and stability compared with the conventional single gate shift register.

Original languageEnglish
Title of host publicationDigest of Technical Papers - SID International Symposium
EditorsKelly Jean Fitzsimmons
PublisherJohn Wiley and Sons Inc.
Pages878-881
Number of pages4
EditionBook 2
ISBN (Electronic)9781510896161, 9781510896161, 9781510896161
DOIs
Publication statusPublished - 2019
EventSID Symposium, Seminar, and Exhibition 2019, Display Week 2019 - San Jose, United States
Duration: 12 May 201917 May 2019

Publication series

NameDigest of Technical Papers - SID International Symposium
NumberBook 2
Volume50
ISSN (Print)0097-966X
ISSN (Electronic)2168-0159

Conference

ConferenceSID Symposium, Seminar, and Exhibition 2019, Display Week 2019
Country/TerritoryUnited States
CitySan Jose
Period12/05/1917/05/19

Bibliographical note

Publisher Copyright:
© 2019 SID-the Society for Information Display. All rights reserved.

Keywords

  • a-IGZO
  • Active matrix
  • Oxide
  • Shift Register
  • Uniformity

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