Highly stable self-aligned coplanar bulk accumulation a-IGZO TFTs under high temperature bias stress

Hyunho Kim, Suhui Lee, Jiseob Lee, Jin Jang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We report the top-gate(TG) self-align(SA) bulk-accumulation(BA) coplanar amorphous indium-gallium-zinc oxide (a-IGZO) thin-film-transistors(TFTs), and its high thermal stability. The advantages of BA TFTs are higher drain currents, threshold-volatge near OV, lower subthreshold slope, good uniformity and stable. And, the BA TFTs with SA structure shows excellent stability under the high temperature.

Original languageEnglish
Title of host publication25th International Display Workshops, IDW 2018
PublisherInternational Display Workshops
Pages319-322
Number of pages4
ISBN (Electronic)9781510883918
Publication statusPublished - 2018
Event25th International Display Workshops, IDW 2018 - Nagoya, Japan
Duration: 12 Dec 201814 Dec 2018

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Conference

Conference25th International Display Workshops, IDW 2018
Country/TerritoryJapan
CityNagoya
Period12/12/1814/12/18

Bibliographical note

Publisher Copyright:
© 2018 International Display Workshops. All rights reserved.

Keywords

  • Amorphous indium gallium zinc oxide (a-IGZO)
  • Bulk accumulation
  • Self-align coplanar
  • Thermal stability

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