Abstract
We reported the antireflective properties of periodic silicon (Si) subwavelength gratings and flat substrates in combination with thermal oxidation for an effective surface passivation. Moreover, theoretical calculations and analysis based on rigorous coupled-wave analysis simulation were performed. For thermally oxidized Si subwavelength grating structures, the reflectance was significantly reduced compared to that of the thermally oxidized flat Si substrates in wide ranges of wavelengths and angles of incidence. As the oxidation time increased, the reflectance became lower with increasing SiOx thickness on Si subwavelength gratings due to the more graded effective refractive index profile from air to the Si via the thermally oxidized Si subwavelength gratings with increased height. By incorporating a thermal oxidation process into the Si subwavelength gratings, a more hydrophobic surface with good surface passivation was obtained.
| Original language | English |
|---|---|
| Pages (from-to) | 409-414 |
| Number of pages | 6 |
| Journal | Applied Physics B: Lasers and Optics |
| Volume | 107 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - May 2012 |
Bibliographical note
Funding Information:This research was supported by the Basic Science Research Program through the NRF funded by the MEST (Nos. 2011-0003857 and 2011-0026393).
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