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Improvement of Stability and Performance of Amorphous Indium Gallium Zinc Oxide Thin Film Transistor by Zinc-Tin-Oxide Spray Coating

  • Hwayeong Lee
  • , Suhui Lee
  • , Youngoo Kim
  • , Abu Bakar Siddik
  • , Mohammad Masum Billah
  • , Jiseob Lee
  • , Jin Jang

Research output: Contribution to journalArticlepeer-review

40 Citations (Scopus)

Abstract

We report the effect of zinc-Tin-oxide (ZTO) by spray coating on indium gallium zinc oxide (IGZO) thin-film transistor (TFT) for the improvement of both stability and performance. The IGZO/ZTO TFT exhibits the field effect mobility ( {\mu }{\text{FE}} ) of 18.39~{\text{cm}}^{2}{/\text{V}\cdot \text{s}} , threshold voltage ( \text{V}{\text{Th}} ) of 0.1 V, and subthreshold swing (SS) of 0.16V/dec. The TFT shows excellent stabilities: \Delta \text{V}{\text{Th}} of-1.0 V for negative bias illumination stress (NBIS) and 0.4 V for hot carrier stress. These excellent performance and stability are correlated with the built-in electric field by charge distribution at the IGZO/ZTO hetero-junction. Therefore, ZTO spray coating on IGZO semiconductor can be a good technique to improve device stability.

Original languageEnglish
Article number9174866
Pages (from-to)1520-1523
Number of pages4
JournalIEEE Electron Device Letters
Volume41
Issue number10
DOIs
Publication statusPublished - Oct 2020

Bibliographical note

Publisher Copyright:
© 1980-2012 IEEE.

Keywords

  • TCAD
  • TFT
  • ZTO
  • a-IGZO
  • heterojunction

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