In-situ monitoring of AuCl3-doping and -dedoping behaviors in graphene

Dong Hee Shin, Sung Kim, Chan Wook Jang, Jong Min Kim, Ju Hwan Kim, Suk Ho Choi

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

In-situ variations of the surface morphology, transmittance, sheet resistance, and Dirac curve of graphene have been monitored during AuCl3-doping and annealing-induced-dedoping processes. The transmittance of graphene shows a monotonically-decreasing behavior due to doping and subequent annealing at higher temperatures (TA), resulting from the continuing increase in the surface corrugations due to intensified coalescing of Au clusters. Electronic parameters, such as the sheet resistance, work function, Dirac point, and electron mobility, show their extreme values when annealed at 50 °C after doping, which can be attributed to further enhancement of a reaction donating electrons to Cl ions from graphene at TA = 50 °C. The annealing at higher TA induces a dedoping effect due to the Cl desorption, thereby decreasing the doping efficiency. These results suggest that Cl anions play a crucial role in the doping and the dedoping processes, especially causing variations in the electronic properties of graphene.

Original languageEnglish
Pages (from-to)1327-1330
Number of pages4
JournalJournal of the Korean Physical Society
Volume64
Issue number9
DOIs
Publication statusPublished - May 2014

Bibliographical note

Funding Information:
This work was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT & Future Planning (No. 2011-0017373).

Keywords

  • Annealing
  • AuCl3 doping
  • Cl anions
  • Dedoping
  • Graphene
  • In situ

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