Inversion domain boundary structure of laterally overgrown c-GaN domains including the inversion from Ga to N polarity at a mask pattern boundary

Hwa Seob Kim, Hyunkyu Lee, Dongsoo Jang, Donghoi Kim, Chinkyo Kim

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

During epitaxial lateral overgrowth, the lateral polarity inversion of c-GaN domains from Ga to N polarity, triggered at the boundary of an SiO2 mask pattern, resulted in inversion domain boundaries (IDBs) forming preferentially on the {1120} plane, although the formation energy of IDBs on the {1100} plane is known to be lower than that on the {1120} plane. A model that takes a geometrical factor into consideration can explain this preferential tendency of IDB formation on the {1120} plane, and computational simulations based on the proposed model are consistent with experimental results. In contrast with the vertically upright IDBs observed in N-to-Ga polarity inversion, vertically slanted IDBs were formed in some samples during the inversion from Ga to N polarity. These polarity inversions, which appeared to randomly occur on the mask pattern, turned out to be triggered at the mask pattern boundaries.

Original languageEnglish
Pages (from-to)1551-1555
Number of pages5
JournalJournal of Applied Crystallography
Volume51
Issue number6
DOIs
Publication statusPublished - Dec 2018

Bibliographical note

Publisher Copyright:
© 2018 International Union of Crystallography.

Keywords

  • Epitaxial lateral overgrowth
  • GaN
  • Inversion domain boundary
  • Polarity inversion

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