Abstract
Oxide-semiconductor-based charge-trap memory thin-film transistors were analyzed in order to figure out the origins of the electrical failure under bending situations. Accurate evaluation on the transfer characteristics and visual inspection of electronic devices on plastic substrate were conducted by using modified bending jigs. Electrical failures of the devices were found to be attributed to the micro-cracks developed in inorganic barriers corresponding to the back-channel regions. Variations in threshold voltage and program speed were also observed before the final failure. These results will be of great help in designing flexible nonvolatile memory devices because there are few researches on the charge-trap mechanism affected by the mechanical stress.
| Original language | English |
|---|---|
| Title of host publication | AM-FPD 2018 - 25th International Workshop on Active-Matrix Flatpanel Displays and Devices |
| Subtitle of host publication | TFT Technologies and FPD Materials, Proceedings |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| ISBN (Print) | 9784990875350 |
| DOIs | |
| Publication status | Published - 15 Aug 2018 |
| Event | 25th International Workshop on Active-Matrix Flatpanel Displays and Devices - TFT Technologies and FPD Materials, AM-FPD 2018 - Kyoto, Japan Duration: 3 Jul 2018 → 6 Jul 2018 |
Publication series
| Name | AM-FPD 2018 - 25th International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials, Proceedings |
|---|
Conference
| Conference | 25th International Workshop on Active-Matrix Flatpanel Displays and Devices - TFT Technologies and FPD Materials, AM-FPD 2018 |
|---|---|
| Country/Territory | Japan |
| City | Kyoto |
| Period | 3/07/18 → 6/07/18 |
Bibliographical note
Publisher Copyright:© 2018 FTFMD.
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