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Investigation of Mechanical-Stress-Induced Electrical Failure of Oxide-Based Flexible Charge-Trap Memory Thin-Film Transistors Fabricated on Plastic Substrates

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

Oxide-semiconductor-based charge-trap memory thin-film transistors were analyzed in order to figure out the origins of the electrical failure under bending situations. Accurate evaluation on the transfer characteristics and visual inspection of electronic devices on plastic substrate were conducted by using modified bending jigs. Electrical failures of the devices were found to be attributed to the micro-cracks developed in inorganic barriers corresponding to the back-channel regions. Variations in threshold voltage and program speed were also observed before the final failure. These results will be of great help in designing flexible nonvolatile memory devices because there are few researches on the charge-trap mechanism affected by the mechanical stress.

Original languageEnglish
Title of host publicationAM-FPD 2018 - 25th International Workshop on Active-Matrix Flatpanel Displays and Devices
Subtitle of host publicationTFT Technologies and FPD Materials, Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Print)9784990875350
DOIs
Publication statusPublished - 15 Aug 2018
Event25th International Workshop on Active-Matrix Flatpanel Displays and Devices - TFT Technologies and FPD Materials, AM-FPD 2018 - Kyoto, Japan
Duration: 3 Jul 20186 Jul 2018

Publication series

NameAM-FPD 2018 - 25th International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials, Proceedings

Conference

Conference25th International Workshop on Active-Matrix Flatpanel Displays and Devices - TFT Technologies and FPD Materials, AM-FPD 2018
Country/TerritoryJapan
CityKyoto
Period3/07/186/07/18

Bibliographical note

Publisher Copyright:
© 2018 FTFMD.

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