Abstract
In-Ga-Zn-O thin-film transistors processed at 150 { \circ}C} on laminated polyethylene naphthalate substrates exhibiting high electrical performances such as a saturation mobility of 24.26 cm/(V s}), a subthreshold slope of 140 mV/dec, a turn-on voltage V\rm on of -0.41 V, and an on-off ratio of 1.8 \times 10}9 were fabricated. Cool-off-type adhesive was adopted to easily detach the plastic substrate from the carrier holder. Devices also showed highly uniform characteristics with a variation of 0.09 V in turn-on voltage. Stability characteristics under the positive gate bias stress can be enhanced by increasing the annealing time at 150°C.
| Original language | English |
|---|---|
| Article number | 6059477 |
| Pages (from-to) | 1692-1694 |
| Number of pages | 3 |
| Journal | IEEE Electron Device Letters |
| Volume | 32 |
| Issue number | 12 |
| DOIs | |
| Publication status | Published - Dec 2011 |
Bibliographical note
Funding Information:Manuscript received July 14, 2011; revised August 16, 2011; accepted August 27, 2011. Date of publication October 24, 2011; date of current version November 23, 2011. This work was supported by the Industrial Strategic Technology Development Program of the Ministry of Knowledge Economy/Korea Evaluation Institute of Industrial Technology (MKE/KEIT) under Project 10035225, Development of Core Technology for High-Performance AMOLED on plastic. The review of this letter was arranged by Editor A. Flewitt.
Keywords
- Oxide
- Sputtering
- Thin-film transistor (TFT)
- Transparent
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