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Low-temperature processed flexible In-Ga-Zn-O thin-film transistors exhibiting high electrical performance

  • Shinhyuk Yang
  • , Jun Yong Bak
  • , Sung Min Yoon
  • , Min Ki Ryu
  • , Himchan Oh
  • , Chi Sun Hwang
  • , Gi Heon Kim
  • , Sang Hee Ko Park
  • , Jin Jang

Research output: Contribution to journalArticlepeer-review

60 Citations (Scopus)

Abstract

In-Ga-Zn-O thin-film transistors processed at 150 { \circ}C} on laminated polyethylene naphthalate substrates exhibiting high electrical performances such as a saturation mobility of 24.26 cm/(V s}), a subthreshold slope of 140 mV/dec, a turn-on voltage V\rm on of -0.41 V, and an on-off ratio of 1.8 \times 10}9 were fabricated. Cool-off-type adhesive was adopted to easily detach the plastic substrate from the carrier holder. Devices also showed highly uniform characteristics with a variation of 0.09 V in turn-on voltage. Stability characteristics under the positive gate bias stress can be enhanced by increasing the annealing time at 150°C.

Original languageEnglish
Article number6059477
Pages (from-to)1692-1694
Number of pages3
JournalIEEE Electron Device Letters
Volume32
Issue number12
DOIs
Publication statusPublished - Dec 2011

Bibliographical note

Funding Information:
Manuscript received July 14, 2011; revised August 16, 2011; accepted August 27, 2011. Date of publication October 24, 2011; date of current version November 23, 2011. This work was supported by the Industrial Strategic Technology Development Program of the Ministry of Knowledge Economy/Korea Evaluation Institute of Industrial Technology (MKE/KEIT) under Project 10035225, Development of Core Technology for High-Performance AMOLED on plastic. The review of this letter was arranged by Editor A. Flewitt.

Keywords

  • Oxide
  • Sputtering
  • Thin-film transistor (TFT)
  • Transparent

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