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Mechanically flexible nonvolatile memory thin-film transistors using oxide semiconductor active channels on ultrathin polyimide films

  • Sung Min Yoon
  • , Hyeong Rae Kim
  • , Hye Won Jang
  • , Ji Hee Yang
  • , Hyo Eun Kim
  • , Sol Mi Kwak

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

1 Citation (Scopus)

Abstract

We overview mechanically flexible nonvolatile memory thin-film transistors (TFTs) for next-generation flexible and stretchable electronic applications. The proposed memory TFTs are featured to be implemented by oxide semiconductor thin films and operated with charge-trap-assisted nonvolatile memory operations on ultrathin colorless polyimide films. The fabrication processes and related technical issues are described for realizing high-performance flexible memory TFTs. We also discuss the memory devices' characteristics and the mechanical flexibility of the fabricated memory TFTs. The novel approaches in material and device structure viewpoints are introduced for further improvements in mechanical flexibility. We finally summarize the remaining issues and future perspectives.

Original languageEnglish
Title of host publicationAmorphous Oxide Semiconductors
Subtitle of host publicationIGZO and Related Materials for Display and Memory
Publisherwiley
Pages431-456
Number of pages26
ISBN (Electronic)9781119715658
ISBN (Print)9781119715573
DOIs
Publication statusPublished - 20 May 2022

Bibliographical note

Publisher Copyright:
© 2022 John Wiley & Sons, Ltd. All rights reserved.

Keywords

  • Charge-trap layer
  • Colorless polyimide
  • Flexible memory
  • In-Ga-Zn-O
  • Memory thin-film transistor
  • Nonvolatile memory
  • Vertical channel
  • ZnO

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