Abstract
Light-induced changes in the stretching mode absorption of Si-H and Si-H2 have been studied for hydrogenated amorphous silicon (a-Si:H) films. The absorption below 2000 cm-1 decreases greatly, but a small change has been observed above 2100 cm-1. The magnitude of the overall change increases as the substrate temperature is lowered and little change is observed for a-Si:H films deposited at above 200°C. The change in boron-doped a-Si:H is small compared with the undoped film deposited at the same substrate temperature. Based on experimental results, it is suggested that the hydrogen in the bulk of a-Si:H diffuses to the microvoids during light illumination.
Original language | English |
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Pages (from-to) | 1673-1675 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 51 |
Issue number | 21 |
DOIs | |
Publication status | Published - 1987 |