Abstract
We report that industrially qualified SbTe chalcogenide film can be applied to programmable metallization cell memory switching device. To fabricate the switching device, Sb35 Te65, Ag, and W (top electrode) were consequently sputtered on TiW (bottom electrode)/ Si O2 Si substrate, and Ag diffusion process was not added. During Ag sputtering, it is apparent that Ag is diffused into Sb35 Te65 film to form Ag-doped Sb35 Te65 solid electrolyte, and that some of the diffused Ag reacts with Te to form Ag-Te bond in the solid electrolyte.
| Original language | English |
|---|---|
| Article number | 162107 |
| Journal | Applied Physics Letters |
| Volume | 91 |
| Issue number | 16 |
| DOIs | |
| Publication status | Published - 2007 |
Bibliographical note
Copyright:Copyright 2008 Elsevier B.V., All rights reserved.
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