Skip to main navigation Skip to search Skip to main content

Optical study of (AlxGa1-x)0.5In 0.5P/GaAs semiconductor alloys by spectroscopic ellipsometry

  • H. Lee
  • , M. V. Klein
  • , D. E. Aspnes
  • , C. P. Kuo
  • , M. Peanasky
  • , M. G. Craford

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)

Abstract

The critical points of (AlxGa1-x) 0.5In0.5P semiconductor alloys grown by metal-organic chemical vapor deposition and lattice matched to GaAs have been measured at room temperature in the 1.5-6.2 eV spectral region using spectroscopic ellipsometry. We have performed standard lineshape analysis of the second derivatives of pseudodielectric function data to obtain the standard critical point parameters (peak position, broadening parameter, amplitude, and excitonic phase angle) as a function of x. The properties of the E1 and the E 11 spectral structures have been observed for the first time. The anomalously small amplitude of the contribution of E 11 spectral feature relative to that of E 1 is attributed to the k-linear interaction between the Λ4,5v and Λ6v valence bands, which is large in III-P alloys due to the very small spin-orbit splitting. The bowing parameter of Δ1 is determined and discussed. The critical point parameters smoothly interpolate between those of the two ternary endpoints, Ga0.5In0.5P and Al 0.5In0.5P. These parameters are discussed and compared with those of AlxGa1-xAs, (AlxGa 1-x)0.5In0.5As/InP, and InxGa 1-xAsyP1-y /InP.

Original languageEnglish
Pages (from-to)400-406
Number of pages7
JournalJournal of Applied Physics
Volume73
Issue number1
DOIs
Publication statusPublished - 1993

Fingerprint

Dive into the research topics of 'Optical study of (AlxGa1-x)0.5In 0.5P/GaAs semiconductor alloys by spectroscopic ellipsometry'. Together they form a unique fingerprint.

Cite this