Photo-cured polymeric insulating materials having high-performance electrical properties

Chemically and thermally stable, durable, photosensitive polymeric insulating materials are in great demand for fabrication of electronic devices. In this study, we have synthesized photosensitive polymers by mixing a host polymer and photosensitizer, and explored their chemical and electrical properties. Uniform, chemically stable, mechanically flexible pinhole-free films can be formed by spin-coating, baking and photolithography at a relatively low temperature (150C); these films are clearly defined by photolithography technique. Their electrical properties showed excellent electrical performance as insulators which depend on chemical structure of a host polymer used and photosensitizer (DAST) concentration. In particular, the insulating property was improved after photo-cross-linking reaction, which is adequate for plastic-based electronic devices such as organic thin-film transistor and flexible display.