Photolithographic patterning of electrically conducting polypyrrole film

Myong Soo Choi; Kitae Song; Young Chul Kim; Young Jun Kim; Jun Young Lee

doi:10.1080/10587250290088843

Photolithographic patterning of electrically conducting polypyrrole film

Myong Soo Choi, Kitae Song, Young Chul Kim, Young Jun Kim, Jun Young Lee

Research output: Contribution to journal › Conference article › peer-review

5 Citations (Scopus)

Abstract

The micro-patterns of electrically conducting polypyrrole (PPy) with line width as low as 30 μm have been successfully achieved using a photolithographic method. PPy as a conducting pattern was chemically polymerized within the poly (vinyl alcohol) (PVA) matrix layer where ferric p-toluenesulfonate as an oxidant was embedded in a designed architecture. Surface resistivity and transmittance at 600 nm of PPy regions were in the range of 10³ ∼ 10⁵ Ω/□ and 50% ∼ 90%, respectively. The resistances of PPy patterns were in the range of 10 ⁴ ∼ 10⁶ Ω, which is lower than that of PVA region by about 10¹⁰ times.

Original language	English
Pages (from-to)	181-184
Number of pages	4
Journal	Molecular Crystals and Liquid Crystals
Volume	377
DOIs	https://doi.org/10.1080/10587250290088843
Publication status	Published - 2002
Event	Proceedings of the Korea-Japan Joint Forum on Organic Materials for Electronics and Photonics (KJF2001) - Seoul, Korea, Republic of Duration: 25 Sept 2001 → 27 Sept 2001

Keywords

Electrically conducting polypyrrole
Micro-patterning
Photolithography

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10.1080/10587250290088843

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title = "Photolithographic patterning of electrically conducting polypyrrole film",

abstract = "The micro-patterns of electrically conducting polypyrrole (PPy) with line width as low as 30 μm have been successfully achieved using a photolithographic method. PPy as a conducting pattern was chemically polymerized within the poly (vinyl alcohol) (PVA) matrix layer where ferric p-toluenesulfonate as an oxidant was embedded in a designed architecture. Surface resistivity and transmittance at 600 nm of PPy regions were in the range of 103 ∼ 105 Ω/□ and 50% ∼ 90%, respectively. The resistances of PPy patterns were in the range of 10 4 ∼ 106 Ω, which is lower than that of PVA region by about 1010 times.",

keywords = "Electrically conducting polypyrrole, Micro-patterning, Photolithography",

author = "Choi, {Myong Soo} and Kitae Song and Kim, {Young Chul} and Kim, {Young Jun} and Lee, {Jun Young}",

note = "Copyright: Copyright 2008 Elsevier B.V., All rights reserved.; Proceedings of the Korea-Japan Joint Forum on Organic Materials for Electronics and Photonics (KJF2001) ; Conference date: 25-09-2001 Through 27-09-2001",

year = "2002",

doi = "10.1080/10587250290088843",

language = "English",

volume = "377",

pages = "181--184",

journal = "Molecular Crystals and Liquid Crystals",

issn = "1058-725X",

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T1 - Photolithographic patterning of electrically conducting polypyrrole film

AU - Choi, Myong Soo

AU - Song, Kitae

AU - Kim, Young Chul

AU - Kim, Young Jun

AU - Lee, Jun Young

PY - 2002

Y1 - 2002

N2 - The micro-patterns of electrically conducting polypyrrole (PPy) with line width as low as 30 μm have been successfully achieved using a photolithographic method. PPy as a conducting pattern was chemically polymerized within the poly (vinyl alcohol) (PVA) matrix layer where ferric p-toluenesulfonate as an oxidant was embedded in a designed architecture. Surface resistivity and transmittance at 600 nm of PPy regions were in the range of 103 ∼ 105 Ω/□ and 50% ∼ 90%, respectively. The resistances of PPy patterns were in the range of 10 4 ∼ 106 Ω, which is lower than that of PVA region by about 1010 times.

AB - The micro-patterns of electrically conducting polypyrrole (PPy) with line width as low as 30 μm have been successfully achieved using a photolithographic method. PPy as a conducting pattern was chemically polymerized within the poly (vinyl alcohol) (PVA) matrix layer where ferric p-toluenesulfonate as an oxidant was embedded in a designed architecture. Surface resistivity and transmittance at 600 nm of PPy regions were in the range of 103 ∼ 105 Ω/□ and 50% ∼ 90%, respectively. The resistances of PPy patterns were in the range of 10 4 ∼ 106 Ω, which is lower than that of PVA region by about 1010 times.

KW - Electrically conducting polypyrrole

KW - Micro-patterning

KW - Photolithography

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U2 - 10.1080/10587250290088843

DO - 10.1080/10587250290088843

M3 - Conference article

AN - SCOPUS:10644241433

SN - 1058-725X

VL - 377

SP - 181

EP - 184

JO - Molecular Crystals and Liquid Crystals

JF - Molecular Crystals and Liquid Crystals

T2 - Proceedings of the Korea-Japan Joint Forum on Organic Materials for Electronics and Photonics (KJF2001)

Y2 - 25 September 2001 through 27 September 2001

ER -

Photolithographic patterning of electrically conducting polypyrrole film

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