Pseudo-crystalline silicon pin diode with C-beam exposure technique

Min Tae Chung, Jung Su Kang, Ha Rim Lee, Ji Hwan Hong, Kyu Chang Park

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We introduced the novel pseudo-crystalline silicon diode fabrication technique with carbon nanotube electron beam (C-beam) irradiation. Compared to the amorphous p-i-n device, the diode characteristics enhanced by C-beam showed enhanced on/off ratio with higher on current. The diode performance will be building block for various devices applications.

Original languageEnglish
Title of host publication22nd International Display Workshops, IDW 2015
PublisherInternational Display Workshops
Pages1576-1578
Number of pages3
ISBN (Electronic)9781510845503
Publication statusPublished - 2015
Event22nd International Display Workshops, IDW 2015 - Otsu, Japan
Duration: 9 Dec 201511 Dec 2015

Publication series

NameProceedings of the International Display Workshops
Volume3
ISSN (Print)1883-2490

Conference

Conference22nd International Display Workshops, IDW 2015
Country/TerritoryJapan
CityOtsu
Period9/12/1511/12/15

Bibliographical note

Publisher Copyright:
© 2015 Proceedings of the International Display Workshops. All rights reserved.

Keywords

  • C-beam
  • CNT emitters
  • Field emission
  • Pseudo-crystal

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