Relationship between field emission characteristics and hydrogen content in DLC deposited by layer-by-layer technique using PECVD

Kyu Chang Park; Jong Hyun Moon; Suk Jae Chung; Myung Hwan Oh; W. I. Milne; Jin Jang

Relationship between field emission characteristics and hydrogen content in DLC deposited by layer-by-layer technique using PECVD

Kyu Chang Park, Jong Hyun Moon, Suk Jae Chung, Myung Hwan Oh, W. I. Milne, Jin Jang

Research output: Contribution to conference › Paper › peer-review

2 Citations (Scopus)

Abstract

We deposited diamond-like-carbon (DLC) films of various hydrogen content by plasma enhanced chemical vapor deposition. The hydrogen content in the DLC film was controlled by a novel technique called a layer-by-layer deposition, in which the deposition of a thin layer of DLC and a CF₄ plasma exposure on its surface were carried out alternatively. The DLC films with different hydrogen content could be obtained by varying the CF₄ plasma exposure time. The emission current increases and turn-on field decreases with decreasing hydrogen content in the DLC film.

Original language	English
Pages	268-272
Number of pages	5
Publication status	Published - 1996
Event	Proceedings of the 1996 9th International Vacuum Microelectronics Conference, IVMC - St.Petersburg, Russia Duration: 7 Jul 1996 → 12 Jul 1996

Conference

Conference	Proceedings of the 1996 9th International Vacuum Microelectronics Conference, IVMC
City	St.Petersburg, Russia
Period	7/07/96 → 12/07/96

Cite this

@conference{d07aa56279d3419ab5f228a55e11a915,

title = "Relationship between field emission characteristics and hydrogen content in DLC deposited by layer-by-layer technique using PECVD",

abstract = "We deposited diamond-like-carbon (DLC) films of various hydrogen content by plasma enhanced chemical vapor deposition. The hydrogen content in the DLC film was controlled by a novel technique called a layer-by-layer deposition, in which the deposition of a thin layer of DLC and a CF4 plasma exposure on its surface were carried out alternatively. The DLC films with different hydrogen content could be obtained by varying the CF4 plasma exposure time. The emission current increases and turn-on field decreases with decreasing hydrogen content in the DLC film.",

author = "Park, {Kyu Chang} and Moon, {Jong Hyun} and Chung, {Suk Jae} and Oh, {Myung Hwan} and Milne, {W. I.} and Jin Jang",

year = "1996",

language = "English",

pages = "268--272",

note = "Proceedings of the 1996 9th International Vacuum Microelectronics Conference, IVMC ; Conference date: 07-07-1996 Through 12-07-1996",

}

Relationship between field emission characteristics and hydrogen content in DLC deposited by layer-by-layer technique using PECVD. / Park, Kyu Chang; Moon, Jong Hyun; Chung, Suk Jae et al.
1996. 268-272 Paper presented at Proceedings of the 1996 9th International Vacuum Microelectronics Conference, IVMC, St.Petersburg, Russia.

Research output: Contribution to conference › Paper › peer-review

TY - CONF

T1 - Relationship between field emission characteristics and hydrogen content in DLC deposited by layer-by-layer technique using PECVD

AU - Park, Kyu Chang

AU - Moon, Jong Hyun

AU - Chung, Suk Jae

AU - Oh, Myung Hwan

AU - Milne, W. I.

AU - Jang, Jin

PY - 1996

Y1 - 1996

N2 - We deposited diamond-like-carbon (DLC) films of various hydrogen content by plasma enhanced chemical vapor deposition. The hydrogen content in the DLC film was controlled by a novel technique called a layer-by-layer deposition, in which the deposition of a thin layer of DLC and a CF4 plasma exposure on its surface were carried out alternatively. The DLC films with different hydrogen content could be obtained by varying the CF4 plasma exposure time. The emission current increases and turn-on field decreases with decreasing hydrogen content in the DLC film.

AB - We deposited diamond-like-carbon (DLC) films of various hydrogen content by plasma enhanced chemical vapor deposition. The hydrogen content in the DLC film was controlled by a novel technique called a layer-by-layer deposition, in which the deposition of a thin layer of DLC and a CF4 plasma exposure on its surface were carried out alternatively. The DLC films with different hydrogen content could be obtained by varying the CF4 plasma exposure time. The emission current increases and turn-on field decreases with decreasing hydrogen content in the DLC film.

UR - http://www.scopus.com/inward/record.url?scp=0030359979&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:0030359979

SP - 268

EP - 272

T2 - Proceedings of the 1996 9th International Vacuum Microelectronics Conference, IVMC

Y2 - 7 July 1996 through 12 July 1996

ER -

Relationship between field emission characteristics and hydrogen content in DLC deposited by layer-by-layer technique using PECVD

Abstract

Conference

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