Seamless image stitching by homography refinement and structure deformation using optimal seam pair detection

Daeho Lee, Seohyung Lee

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

We propose an image stitching method that can remove ghost effects and realign the structure misalignments that occur in common image stitching methods. To reduce the artifacts caused by different parallaxes, an optimal seam pair is selected by comparing the cross correlations from multiple seams detected by variable cost weights. Along the optimal seam pair, a histogram of oriented gradients is calculated, and feature points for matching are detected. The homography is refined using the matching points, and the remaining misalignment is eliminated using the propagation of deformation vectors calculated from matching points. In multiband blending, the overlapping regions are determined from a distance between the matching points to remove overlapping artifacts. The experimental results show that the proposed method more robustly eliminates misalignments and overlapping artifacts than the existing method that uses single seam detection and gradient features.

Original languageEnglish
Article number063016
JournalJournal of Electronic Imaging
Volume26
Issue number6
DOIs
Publication statusPublished - 1 Nov 2017

Bibliographical note

Publisher Copyright:
© 2017 SPIE and IS&T.

Keywords

  • optimal seam pair
  • seamless image stitching
  • structure deformation

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