Surface properties of a YBa2Cu3O7-δ thin film after photo-lithographic treatment

Yunsung Huh; Jin Tae Kim; Yunseok Hwang; Yongsup Park; Youngjin So; In Seon Kim; Soon Gul Lee; Gwangseo Park; Yong Ki Park; Jong Chul Park

doi:10.1143/jjap.37.2478

Surface properties of a YBa₂Cu₃O_7-δ thin film after photo-lithographic treatment

Yunsung Huh
, Jin Tae Kim
, Yunseok Hwang
, Yongsup Park
, Youngjin So
, In Seon Kim
, Soon Gul Lee
, Gwangseo Park
, Yong Ki Park
, Jong Chul Park

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

The effect of photolithographic treatments on the surface of a YBa₂Cu₃O_7-δ thin film has been investigated by measuring the electrical contact resistance and performing X-ray photoemission spectroscopy (XPS) experiment. Water plays an important role in increasing the electrical contact resistance of the YBa₂Cu₃O_7-δ thin film, as compared with the developer and photoresist (PR); water removes oxygen from the surface and increases the contact resistance. The chemical interaction with the PR or developer is not a key element in increasing the contact resistance. XPS spectra show that the oxygen concentration of the surface of a YBa₂Cu₃O_7-δ thin film is reduced after the photolithographic process.

Original language	English
Pages (from-to)	2478-2481
Number of pages	4
Journal	Japanese Journal of Applied Physics
Volume	37
Issue number	5 A
DOIs	https://doi.org/10.1143/jjap.37.2478
Publication status	Published - 1998

Keywords

Contactresistance
Photolithography
Superconducting YBCO film
Surface property
XPS

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10.1143/jjap.37.2478

Cite this

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title = "Surface properties of a YBa2Cu3O7-δ thin film after photo-lithographic treatment",

abstract = "The effect of photolithographic treatments on the surface of a YBa2Cu3O7-δ thin film has been investigated by measuring the electrical contact resistance and performing X-ray photoemission spectroscopy (XPS) experiment. Water plays an important role in increasing the electrical contact resistance of the YBa2Cu3O7-δ thin film, as compared with the developer and photoresist (PR); water removes oxygen from the surface and increases the contact resistance. The chemical interaction with the PR or developer is not a key element in increasing the contact resistance. XPS spectra show that the oxygen concentration of the surface of a YBa2Cu3O7-δ thin film is reduced after the photolithographic process.",

keywords = "Contactresistance, Photolithography, Superconducting YBCO film, Surface property, XPS",

author = "Yunsung Huh and Kim, \{Jin Tae\} and Yunseok Hwang and Yongsup Park and Youngjin So and Kim, \{In Seon\} and Lee, \{Soon Gul\} and Gwangseo Park and Park, \{Yong Ki\} and Park, \{Jong Chul\}",

year = "1998",

doi = "10.1143/jjap.37.2478",

language = "English",

volume = "37",

pages = "2478--2481",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "5 A",

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TY - JOUR

T1 - Surface properties of a YBa2Cu3O7-δ thin film after photo-lithographic treatment

AU - Huh, Yunsung

AU - Kim, Jin Tae

AU - Hwang, Yunseok

AU - Park, Yongsup

AU - So, Youngjin

AU - Kim, In Seon

AU - Lee, Soon Gul

AU - Park, Gwangseo

AU - Park, Yong Ki

AU - Park, Jong Chul

PY - 1998

Y1 - 1998

N2 - The effect of photolithographic treatments on the surface of a YBa2Cu3O7-δ thin film has been investigated by measuring the electrical contact resistance and performing X-ray photoemission spectroscopy (XPS) experiment. Water plays an important role in increasing the electrical contact resistance of the YBa2Cu3O7-δ thin film, as compared with the developer and photoresist (PR); water removes oxygen from the surface and increases the contact resistance. The chemical interaction with the PR or developer is not a key element in increasing the contact resistance. XPS spectra show that the oxygen concentration of the surface of a YBa2Cu3O7-δ thin film is reduced after the photolithographic process.

AB - The effect of photolithographic treatments on the surface of a YBa2Cu3O7-δ thin film has been investigated by measuring the electrical contact resistance and performing X-ray photoemission spectroscopy (XPS) experiment. Water plays an important role in increasing the electrical contact resistance of the YBa2Cu3O7-δ thin film, as compared with the developer and photoresist (PR); water removes oxygen from the surface and increases the contact resistance. The chemical interaction with the PR or developer is not a key element in increasing the contact resistance. XPS spectra show that the oxygen concentration of the surface of a YBa2Cu3O7-δ thin film is reduced after the photolithographic process.

KW - Contactresistance

KW - Photolithography

KW - Superconducting YBCO film

KW - Surface property

KW - XPS

UR - https://www.scopus.com/pages/publications/0032068834

U2 - 10.1143/jjap.37.2478

DO - 10.1143/jjap.37.2478

M3 - Article

AN - SCOPUS:0032068834

SN - 0021-4922

VL - 37

SP - 2478

EP - 2481

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 5 A

ER -

Surface properties of a YBa₂Cu₃O_7-δ thin film after photo-lithographic treatment

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Keywords

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