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Tuning wall thicknesses in mesoporous silica films for optimization of optical anti-reflective properties

  • Nawfel Abdullah
  • , Md Shahriar A. Hossain
  • , Konstantin Konstantinov
  • , Hirofumi Tanabe
  • , Mikiya Matsuura
  • , Kazuhiko Maekawa
  • , Amanullah Fatehmulla
  • , Wazirzada Aslam Farooq
  • , Md Tofazzal Islam
  • , Yoshio Bando
  • , Yusuf Valentino Kaneti
  • , Yusuke Yamauchi

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

This work reports the fabrication of mesoporous silica films with controllable wall thicknesses by spin coating of precursor solutions consisting of polystyrene-block-polybutadiene-block-polystyrene based triblock copolymers (Hydrogenated methyl Styrene Ethylene Butadiene methyl Styrene, HmSEBmS) and tetraethyl orthosilicate (TEOS) followed by calcination in air at 600 °C, for optical anti-reflection films. By changing the relative weight of the triblock polymer to TEOS, the pore-Topore distance in the mesoporous silica film can be controlled without significantly affecting the size of the mesopores, thus, enabling effective control of the refractive index and porosity of the films. In terms of optical properties, the transmittance of the fabricated mesoporous silica film is approximately 3.3% higher than that of the uncoated glass substrate in the wavelength range of 400 to 750 nm.

Original languageEnglish
Pages (from-to)100-103
Number of pages4
JournalJournal of Nanoscience and Nanotechnology
Volume18
Issue number1
DOIs
Publication statusPublished - 2018

Bibliographical note

Funding Information:
tion to the International Scientific Partnership Program (ISPP) at King Saudi University (KSU) for funding this research work through ISPP-0066.

Publisher Copyright:
Copyright © 2018 American Scientific Publishers All rights reserved.

Keywords

  • Anti-reflective films
  • Mesoporous films
  • Mesoporous materials
  • Optical properties
  • Silica

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