Abstract
This work reports the fabrication of mesoporous silica films with controllable wall thicknesses by spin coating of precursor solutions consisting of polystyrene-block-polybutadiene-block-polystyrene based triblock copolymers (Hydrogenated methyl Styrene Ethylene Butadiene methyl Styrene, HmSEBmS) and tetraethyl orthosilicate (TEOS) followed by calcination in air at 600 °C, for optical anti-reflection films. By changing the relative weight of the triblock polymer to TEOS, the pore-Topore distance in the mesoporous silica film can be controlled without significantly affecting the size of the mesopores, thus, enabling effective control of the refractive index and porosity of the films. In terms of optical properties, the transmittance of the fabricated mesoporous silica film is approximately 3.3% higher than that of the uncoated glass substrate in the wavelength range of 400 to 750 nm.
| Original language | English |
|---|---|
| Pages (from-to) | 100-103 |
| Number of pages | 4 |
| Journal | Journal of Nanoscience and Nanotechnology |
| Volume | 18 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2018 |
Bibliographical note
Funding Information:tion to the International Scientific Partnership Program (ISPP) at King Saudi University (KSU) for funding this research work through ISPP-0066.
Publisher Copyright:
Copyright © 2018 American Scientific Publishers All rights reserved.
Keywords
- Anti-reflective films
- Mesoporous films
- Mesoporous materials
- Optical properties
- Silica
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