Ultrafast photoluminescence from freestanding Si nanocrystals

Sung Kim, Dong Hee Shin, Suk Ho Choi

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9 Citations (Scopus)

Abstract

SiO 1.2/SiO 2 multilayers were grown on n-type (100) Si wafers by ion beam sputtering and subsequently annealed at 1100 °C to form SiO 2-embedded Si (S-Si) nanocrystals (NCs). The SiO 2 matrix was then removed from S-Si NCs by chemical treatments to prepare freestanding Si (F-Si) NCs. The photoluminescence (PL) peak of F-Si NCs at ∼657 nm (1.89 eV) is blue-shifted with respect to that of S-Si NCs at ∼816 nm (1.52 eV). The peak shift of ∼0.37 eV is much larger than what is expected by the quantum confinement effect. The PL lifetime of F-Si NCs (∼3 ns) is much shorter than that of S-Si NCs (∼50 μs). Possible physical mechanisms are discussed to explain the origin of the fast PL band found in F-Si NCs.

Original languageEnglish
Article number253103
JournalApplied Physics Letters
Volume100
Issue number25
DOIs
Publication statusPublished - 18 Jun 2012

Bibliographical note

Funding Information:
This work was supported by a grant from the Kyung Hee University in 2011 (KHU – 20110239) and was performed using the high-voltage electron microscope (JEM-ARM1300S, Jeol, Japan) installed at Korea Basic Science Institute.

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